A model-based OPC toolkit for extraction of lithography parameters and generation of OPC'ed masks

Peng Sun

BSD-3

1. "Mask design for optical microlithography - an inverse imaging problem," IEEE Trans. Image Processing, 16, 774-788, (2007).
2. "OPC and PSM design using inverse lithography: a non-linear optimization approach," Proc. SPIE 6154, Optical Microlithography XIX, 61543H, (2006).